Negative photoresist compositions with polyglutarimide polymer

Details Negative photoresist compositions with polyglutarimide polymer Negative photoresist compositions with polyglutarimide polymer

1984-01-16

1986-02-11

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430194, 430270, 430281, 430286, 430927, 430325, G03C 152, G03C 171

Patent

active

045698970

ABSTRACT:
This invention relates to negative photoresist compositions containing thermally stable polyglutarimide polymers dissolved in suitable solvents. The negative resists are useful for producing high resolution images on surfaces by exposing the resist to a wide range of exposing radiation wavelengths and by subsequently developing the unexposed resist with an organic solvent or an aqueous base developer. The polyglutarimide polymers can be formulated so that they are partially soluble in an aqueous base, compatible with aqueous base soluble photosensitizers, and developable in aqueous base solutions, thereby eliminating the need for the use of any organic solvent.

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patent: 4246374 (1981-01-01), Kopchik
patent: 4524121 (1985-06-01), Gleim et al.

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