Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1999-04-05
2000-11-14
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
4302701, 430325, 430330, 430910, G03F 7004
Patent
active
061468061
ABSTRACT:
It is an object of the present invention to provide a negative photoresist composition for lithography, using short-wavelength light such as ArF excimer laser beam as a light source.
The negative photoresist composition of the present invention is a negative photoresist composition comprising at least a polymer having a unit represented by the general formula (1) ##STR1## , a crosslinking agent and a photo-acid generating agent, and the crosslinking agent is capable of crosslinking the polymer in the presence of an acid catalyst, whereby the polymer is insolubilized in a developer. Since the negative resist composition of the present invention is insolubilized in the developer by an action of an acid produced from the photo-acid generating agent at the exposed portion, a negative pattern can be obtained. Since the polymer has not a benzene ring, unlike a base polymer of a conventional negative resist, the polymer has high transparency to ArF excimer laser beam and also has high etching resistance because of its bridged alicyclic group.
REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 5665518 (1997-09-01), Maeda et al.
patent: 5770346 (1998-06-01), Iwasa et al.
patent: 5851727 (1998-12-01), Choi et al.
patent: 6030747 (2000-02-01), Nakano et al.
Hofer, D., et al., "193 nm Photoresist R&D: The Risk & Challenge," Journal of Photopolymer Science and Technology, vol. 9, No. 3, pp. 387-398 (1996).
Thackeray, J., et al., "Deep UV ANR Photoresist for 248 nm Excimer Laser Photolithography," Proceedings of SPIE, vol. 1056, pp. 34-47 (1989).
Takechi, S., et al., "Allcyclic Polymer for ArF and KrF Excimer Resist Based on Chemical Amplification," Journal of Photopolymer Science & Technology, vol. 5, No. 3, pp. 439-446 (1992).
Allen, R.D., et al., "Resolution and ETCH Resistance of a Family of 193 nm Positive Resists," Journal of Photopolymer Science and Technology, vol. 8, No. 4, pp. 623-636 (1995).
Allen, R.D., et al., "Progrees in 193 nm Positive Resists," Journal of Photopolymer Science and Technology, vol. 9, No. 3, pp. 465-474 (1996).
Maeda, K., et al., "Novel Alkaline-Soluble Alicyclic Polymer Poly(TCDMACOOH) for ArF Chemically Amplified Positive Resists," Proceedings of SPIE, vol. 2724, pp. 377-398 (1996).
Crivello, J.V., et al., "A New Preparation of Triarylsulfonium and-selenonium Salts via the Copper (II)-Catalyzed Arylation of Sulfides and Selenides with Diaryliodonium Salts," J. Org. Chem., vol. 43, No. 15, pp. 3055-3058n (1978).
Crivello, J.V., et al., "New Photoinitiators for Cationic Polymerization," J. Polymer Sci., Symposium No. 56, pp. 383-395 (1976).
Houlihan, F.M., "The Synthesis, Characterization and Lithography of a .alpha.-Substituted 2-Nitrobenzyl Arylsulfonate Photo-Acid Generators with Improved Resistance to Post Exposure Bake," Proceedings of SPIE, vol. 2195, pp. 137-151 (1994).
Ueno, T., et al., "Chemical Amplification Positive Resist Systems Using Novel Sulfonates as Acid Generators," Proceedings of PME, pp. 413-424 (1989).
Hasegawa Etsuo
Iwasa Shigeyuki
Maeda Katsumi
Nakano Kaichiro
Chu John S.
NEC Corporation
LandOfFree
Negative photoresist composition using polymer having 1,2-diol s does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Negative photoresist composition using polymer having 1,2-diol s, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Negative photoresist composition using polymer having 1,2-diol s will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2063593