Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1997-01-27
1998-04-21
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430176, 430302, 430325, 430944, 430945, G03F 7021, G03F 730
Patent
active
057416192
ABSTRACT:
A negative-working image-recording material containing both a substance which absorbs light and generates heat and a diazonium compound having two or more diazohio groups in the molecule and a negative-working lithographic plate for direct platemaking by heat mode writing, the lithographic plate comprising a support having provided on at least one surface a substance which absorbs infrared or near infrared light and generates heat and a diazonium compound having two or more diazonio groups in the molecule.
REFERENCES:
patent: 4123276 (1978-10-01), Kita et al.
patent: 4248959 (1981-02-01), Jeffers et al.
patent: 4334006 (1982-06-01), Kitajima et al.
patent: 5089372 (1992-02-01), Kirihata et al.
patent: 5153095 (1992-10-01), Kawamura et al.
patent: 5372915 (1994-12-01), Haley et al.
patent: 5478690 (1995-12-01), Kanda et al.
Aoshima Keitaro
Kitatani Katsuji
Shiraishi Yuichi
Yokoya Hiroaki
Chu John S.
Fuji Photo Film Co. , Ltd.
LandOfFree
Negative image-recording material comprising an acrylic resin, a does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Negative image-recording material comprising an acrylic resin, a, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Negative image-recording material comprising an acrylic resin, a will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2056423