Negative image process utilizing photosensitive compositions con

Details Negative image process utilizing photosensitive compositions con Negative image process utilizing photosensitive compositions con

1992-02-11

1993-12-21

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaged product

Including resin or synthetic polymer

430165, 430291, 430313, 430315, 430319, 430325, G03F 736, G03F 738

Patent

active

052720268

ABSTRACT:
A photosensitive composition having contrast and selectivity, useful in forming high resolution patterns.
The composition comprises a phenolic resin, a diazoquinone compound and an aromatic fused polycyclic sulfonic or carboxylic acid, in the form of the free acid and/or an ammonium salt and/or an acid halide, the cation component of the ammonium salt having the formula ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4, each represent hydrogen, C.sub.1 -C.sub.4 -alkyl or C.sub.1 -C.sub.4 -hydroxyalkyl.
In forming a negative pattern, the composition is coated on a substrate and exposed imagewise to ultraviolet radiation, thereafter treated with a silicon compound, whereby the silicon compound is selectively absorbed into the irradiated portions and the non-irradiated portions are then removed by dry etching.

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