Near-field optical probe based on SOI substrate and...

Etching a substrate: processes – Forming or treating an article whose final configuration has...

Reexamination Certificate

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C216S024000, C216S041000, C216S057000, C250S306000, C250S307000, C250S324000, C250S216000, C173S105000, C257SE21530, C257SE21223, C257SE21252, C257SE23078, C257SE27006, C438S050000, C438S052000, C438S053000, C438S066000, C438S702000, C977S873000, C977S875000, C977S878000

Reexamination Certificate

active

07871530

ABSTRACT:
Provided is near-field optical probe including: a cantilever arm support portion that is formed of a lower silicon layer of a silicon-on-insulator (SOI) substrate, the cantilever arm support portion having a through hole formed therein at a side of the lower silicon layer; and a cantilever arm forming of a junction oxidation layer pattern and an upper silicon layer pattern on the SOI substrate that are supported on an upper surface of the lower silicon layer and each have a smaller hole than the through hole, a silicon oxidation layer pattern having a tip including an aperture at a vertical end, corresponding with the hole on the upper silicon layer pattern, and an optical transmission prevention layer that is formed on the silicon oxidation layer pattern and does not cover the aperture.

REFERENCES:
patent: 5202281 (1993-04-01), Ishibashi
patent: 5666190 (1997-09-01), Quate et al.
patent: 7393713 (2008-07-01), Kim et al.
patent: 1020040035497 (2004-04-01), None
patent: 1020050102158 (2005-10-01), None
Ki-Bong Song, et al; “Fabrication of a High-Throughput Cantilever-Style Aperture Tip by the Use of the Bird's-Beak Effect”, ©2003 The Japan Society of Applied Physics, Jpn. J. Appl. Phys., vol. 42, pp. 4353-4356.
P. Grabiec, et al; “SNOM/AFM microphone integrated with piezoresistive cantilever beam for multifunctional surface analysis” ©2002 Microelectronic Engineering 61-62, pp. 981-986.

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