Near-field light generating structure, near-field exposure...

Details Near-field light generating structure, near-field exposure... Near-field light generating structure, near-field exposure...

2007-10-09

2007-10-09

Luu, Thanh X. (Department: 2878)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S396000

Reexamination Certificate

active

10936806

ABSTRACT:
A near-field exposure mask includes a mask base material and a light blocking layer formed on the base material, the light blocking layer includes a fine metal structure or fine opening formed in the light blocking layer. The size of the metal structure or the size of the opening is not more than a wavelength of light for exposure, and at least one of a cross section of the fine metal structure in a direction perpendicular to a surface of the mask, and a cross section of the fine opening in a direction perpendicular to the mask surface has an asymmetrical sectional shape with respect to an arbitrary axis perpendicular to the mask surface.

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Binning, G., et al. “Surface Studies by Scanning Tunneling Microscopy,”Physical Review Letters,vol. 49, No. 1, Jul. 5, 1982. pp. 57-61.

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