Near-field light exposure mask with avoidance of overlap of...

Details Near-field light exposure mask with avoidance of overlap of... Near-field light exposure mask with avoidance of overlap of...

2006-02-21

2006-02-21

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07001696

ABSTRACT:
A near-field light exposure mask provided with a plurality of apertures each having a width smaller than the wavelength of light used for exposure. In the mask described above, among the plurality of apertures, apertures adjacent to each other are disposed at a necessary distance so that near-field light effused from one of the apertures adjacent to each other does not overlap that generated from the other aperture.

REFERENCES:
patent: 6171730 (2001-01-01), Kuroda et al.
patent: 6187482 (2001-02-01), Kuroda et al.
patent: 2001/0046719 (2001-11-01), Yamaguchi et al.
patent: 2002/0071106 (2002-06-01), Yano et al.
patent: 2004/0080732 (2004-04-01), Kuroda et al.
patent: 11-145051 (1999-05-01), None
patent: 11-184094 (1999-07-01), None

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