Near-field exposure mask, near-field exposure apparatus, and...

Details Near-field exposure mask, near-field exposure apparatus, and... Near-field exposure mask, near-field exposure apparatus, and...

2007-09-28

2009-10-20

Mathews, Alan A (Department: 2851)

Photocopying

Contact printing

C355S075000, C355S076000, C355S091000, C430S005000, C430S396000

Reexamination Certificate

active

07605908

ABSTRACT:
A near-field exposure mask includes a light blocking film having an opening smaller than a wavelength of exposure light, and a mask base material for holding the light blocking film. The near-field exposure mask is configured and positioned to effect exposure of an object to be exposed to near-field light generated corresponding to the opening during contact thereof with the object to be exposed. The mask base material is transparent to the exposure light and comprises a synthetic resin material having Young's modulus in a range of 1 GPa or more to 10 GPa or less.

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M.M. Alkaisi, “Sub-diffraction-limited patterning using evanescent near-field optical lithography,” Applied Physics Letters, vol. 75, No. 22, Nov. 29, 1999, pp. 3560-3562.

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