Near field exposure mask, method of forming resist pattern...

Details Near field exposure mask, method of forming resist pattern... Near field exposure mask, method of forming resist pattern...

2011-06-28

2011-06-28

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S322000

Reexamination Certificate

active

07968256

ABSTRACT:
Provided are a near field exposure mask which can suppress heat generation of a mask during exposure and can also suppress variation in size of a resist pattern for each shot, and a resist pattern forming method using the same. The near field exposure mask includes a transparent mask matrix l0; a light shielding layer l2formed above the transparent mask matrix l0and containing silicon; a reflective layer l1formed between the transparent mask matrix l0and the light shielding layer l2; and an opening pattern provided in the reflective layer l1and the light shielding layer l2and being less in size than an exposure wavelength λ (nm), wherein the reflectance at an interface between the transparent mask matrix l0and the reflective layer l1is higher than a reflectance at an interface between a transparent mask matrix and a light shielding layer formed on the transparent mask matrix and containing silicon of a near field exposure mask which has no reflective layer between the transparent mask matrix and the light shielding layer.

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