Near-field exposure apparatus and near-field exposure photomask

Details Near-field exposure apparatus and near-field exposure photomask Near-field exposure apparatus and near-field exposure photomask

2007-03-13

2007-03-13

Huff, Mark F. (Department: 1756)

Photocopying

Contact printing

C430S005000

Reexamination Certificate

active

10779786

ABSTRACT:
A near-field exposure apparatus including a light source, a stage on which an object to be exposed to light is placed, and a photomask with a deformable membrane portion having on a first surface a light shielding membrane that has a micro aperture and a substrate for supporting a peripheral region of a second surface of the deformable membrane portion. Exposure is conducted with the deformable membrane portion in a sagged condition. The photomask has a stress relieving structure to relieve stress that is generated at a border between the deformable membrane portion and the substrate when the deformable membrane portion sags. The stress relieving structure is one of: a reinforcing member placed at the border, the substrate being partially thinned near the border, and an intermediate layer that is formed between the substrate and the second surface of the deformable membrane portion.

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patent: 11-145051 (1999-05-01), None
English Translation of previously cited Nakamura et al. (JP 61-65250 A) Adhesion-Type Glass Mask, 1986.

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