Near field analysis apparatus having irradiation-side guide...

Details Near field analysis apparatus having irradiation-side guide... Near field analysis apparatus having irradiation-side guide...

2007-06-26

2007-06-26

Le, Que T. (Department: 2878)

Radiant energy

Photocells; circuits and apparatus

With circuit for evaluating a web, strand, strip, or sheet

C250S559300

Reexamination Certificate

active

11316402

ABSTRACT:
A near field analysis apparatus comprising: an irradiation optical system comprising an irradiation-side adjustable optical system for adjusting the position or angle of an optical axis thereof, and irradiating irradiation-side guide light onto an adjustment surface via the irradiation-side adjustable optical system; a light collecting optical system comprising a light-collection-side adjustable optical system for adjusting the position or angle of an optical axis thereof, and irradiating light-collection-side guide light onto the adjustment surface via the light-collection-side adjustable optical system; an irradiation-side adjustment device for adjusting the position or angle of the irradiation-side adjustable optical system such that the spots of the guide light, which are observed at the adjustment surface, match; and a light-collection-side adjustment device for adjusting the position or angle of the light-collection-side adjustable optical system such that the spots of the guide light, which are observed at the adjustment surface, match.

REFERENCES:
patent: 5243195 (1993-09-01), Nishi
Japanese Patent Abstract Publication No. 2001153785 published Jun. 8, 2001, one page.
Japanese Patent Abstract Publication No. 2001165842 published Jun. 22, 2001, one page.
Feige et al., “Calibration of a scanning probe microscope by the use of an interference-holographic position measurement system,” Meas. Sci. Technol. 14 (2003) pp. 1032-1039.
Japanese Patent Abstract Publication No. 11-101743 published Apr. 13, 1999, one page.

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