Near atmospheric pressure treatment of polymers using helium dis

Chemistry: electrical and wave energy – Processes and products – Processes of treating materials by wave energy

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427299, C07C 100, B05D 300

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057674698

ABSTRACT:
The present invention is a method and apparatus for treating a polyester support such as polyethylene napthalate or polyethylene terephthalate. The treatment is carried out at near atmospheric pressure in a gas of helium and nitrogen or oxygen. The treatment uses anodized aluminum electrodes and an atmospheric glow discharge results when the electrodes are connected to an RF generator and spaced about 2 mm apart. The process and apparatus improve adhesion of subsequently coated emulsions on the polyester support.

REFERENCES:
patent: 3396308 (1968-08-01), Whitmore
patent: 3411908 (1968-11-01), Crawford et al.
patent: 3531314 (1970-09-01), Kerr et al.
patent: 3582339 (1971-06-01), Martens et al.
patent: 3607345 (1971-09-01), Thomas et al.
patent: 3630742 (1971-12-01), Crawford et al.
patent: 3654108 (1972-04-01), Smith, Jr.
patent: 3837886 (1974-09-01), Tatsuta et al.
patent: 3860427 (1975-01-01), Matsuo et al.
patent: 3874877 (1975-04-01), Omichi et al.
patent: 3888753 (1975-06-01), Kiikka et al.
patent: 4051302 (1977-09-01), Mayama et al.
patent: 4055685 (1977-10-01), Bayer et al.
patent: 4059497 (1977-11-01), Kolbe et al.
patent: 4087575 (1978-05-01), Bichara
patent: 4124395 (1978-11-01), Ochiai et al.
patent: 4148705 (1979-04-01), Battey et al.
patent: 4209357 (1980-06-01), Gorin et al.
patent: 4229523 (1980-10-01), Ohta et al.
patent: 4239973 (1980-12-01), Kolbe et al.
patent: 4241169 (1980-12-01), Work, III et al.
patent: 4252595 (1981-02-01), Yamamoto et al.
patent: 4267202 (1981-05-01), Nakayama et al.
patent: 4297162 (1981-10-01), Mundt et al.
patent: 4298440 (1981-11-01), Hood
patent: 4363872 (1982-12-01), Ealding
patent: 4394442 (1983-07-01), Miller
patent: 4429032 (1984-01-01), Matthe et al.
patent: 4451497 (1984-05-01), Dolezalek et al.
patent: 4518681 (1985-05-01), Johnson et al.
patent: 4649097 (1987-03-01), Tsukada et al.
patent: 4701403 (1987-10-01), Miller
patent: 4793975 (1988-12-01), Drage
patent: 4993267 (1991-02-01), Allard et al.
patent: 5004669 (1991-04-01), Yamada et al.
patent: 5019117 (1991-05-01), Nakamura et al.
patent: 5022979 (1991-06-01), Hijikata et al.
patent: 5031571 (1991-07-01), Igarashi et al.
patent: 5136820 (1992-08-01), Wong et al.
patent: 5156820 (1992-10-01), Wong et al.
patent: 5171369 (1992-12-01), Elwart et al.
patent: 5185132 (1993-02-01), Horiike et al.
patent: 5185238 (1993-02-01), Oikawa
patent: 5194291 (1993-03-01), D'Aoust et al.
patent: 5224441 (1993-07-01), Felts et al.
patent: 5244780 (1993-09-01), Strobel et al.
patent: 5342582 (1994-08-01), Horn et al.
patent: 5424103 (1995-06-01), Ahn
"Proc. Jpn. Symp. Plasma Chem. 2", 1989, pp. 109-112, by A. Nagata, S. Takehiro, H. Sumi, M. Kogama, S. Okazaki, and Y. Horikie.
J. Phys. D: Appl. Phys 23 (1990) pp. 1125-1128, "The Mechanism of the Stabilization of Glow Plasma at Atmospheric Pressure" by T. Yokoyama, M. Kogoma, T. Moriwaki, and S. Okazaki.
"Rapid Communication: Appearance of Stable Glow Discharge in Air, Argon, Oxygen, and Nitrogen at Atmospheric Pressure Using a 50Hz Source", pp. 889-892 by S. Okazaki, M. Kogoma, M. Uehara, and Y. Kimura.
J. Phys. D: Appln. Phys. 23 (1990) pp. 374-377, "The Improvement of the Atmospheric Pressure Glow Plasma Method and the Deposition of Organic Films", by T. Yokoyama M. Kogoma, S. Kanazawa, T. Moriwaki, and S. Okazaki.
Nuclear Instruments and Methods in Physics Research B37/38 (1989) pp. 842-845, "Glow Plasma Treatment at atmospheric Pressure for Surface Modification and Film Deposition" by S. Kanazawa, M. Kogoma, S. Okazaki, and T. Moriwaki.
J. Phys. D: Appln. Phys. 21 (1988) pp. 838-840, "Stable Glow Plasma at Atmospheric Pressure" by S. Kanazawa, M. Kogoma, T. Moriwaki, and S. Okazaki.

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