Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product
Patent
1989-08-22
1991-12-24
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
430270, 430945, 540128, 540131, 540140, G03C 100, G03C 1492, C09B 4704
Patent
active
050752030
ABSTRACT:
A naphthalocyanine derivative having at least one substituent of the formula: SO.sub.2 R.sup.1, wherein R.sup.1 is an alkyl group, a substituted alkyl group or an aryl group is excellent in ability to absorb diode laser beams and suitable for use in an optical recording medium.
REFERENCES:
patent: 2953574 (1960-09-01), Martin
patent: 3013006 (1961-12-01), Bienert
patent: 4648992 (1987-03-01), Graf et al.
patent: 4725525 (1988-02-01), Kenney et al.
patent: 4798781 (1989-01-01), Hirose et al.
Akimoto Takayuki
Hagiwara Hideo
Hayashi Nobuyuki
Kamijima Koichi
Katayose Mitsuo
Bowers Jr. Charles L.
Hitachi Chemical Company Ltd.
Pezzner Ashley I.
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