Naphthalenetetracarboxylic acid diimide derivatives and photosen

Details Naphthalenetetracarboxylic acid diimide derivatives and photosen Naphthalenetetracarboxylic acid diimide derivatives and photosen

1999-05-27

2000-10-03

Martin, Roland

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430 83, G03G 5047, G03G 509

Patent

active

061270768

ABSTRACT:
Naphthalenetetracarboxylic acid diimide derivatives represented by the following general formula, ##STR1## wherein R is a hydrogen atom, an alkyl group, an alkoxyl group or a halogen atom, R1 and R2 are different from each other and may be a substituted or unsubstituted alkyl group, alkoxyl group or an aryl group, respectively, and R3 is a hydrogen atom, a substituted or unsubstituted alkyl group, an alkoxyl group or an aryl group.
The derivatives exhibit excellent solubility in an organic solvent, excellent compatibility with a resin binder and excellent photosensitivity, and are very useful as an electron transporting agent for the electrophotosensitive material.

REFERENCES:
patent: 4442193 (1984-04-01), Chen et al.
patent: 4992349 (1991-02-01), Chen et al.
patent: 5468583 (1995-11-01), Gruenbaum et al.
patent: 5952140 (1999-09-01), Visser et al.

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