Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Radiation-sensitive composition or product
Reexamination Certificate
2007-11-06
2007-11-06
RoDee, Christopher (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Radiation-sensitive composition or product
C430S078000, C546S075000
Reexamination Certificate
active
10859318
ABSTRACT:
Naphthalenetetracarboxylic acid diimide derivatives and an electrophotographic photoconductive material containing the naphthalenetetracarboxylic acid diimide derivatives. The naphthalenetetracarboxylic acid diimide derivatives have a structure represented by the following formula:in which, R1and R2are each independently selected from the group consisting of a substituted or non-substituted C1-C20alkyl group; a substituted or non-substituted C1-C20alkoxy group; a substituted or non-substituted C6-C30aryl group; and a substituted or non-substituted C7-C30aralkyl group; and halogen. The electrophotographic photoconductive material includes the naphthalenetetracarboxylic acid diimide derivatives as an electron transferring material.
REFERENCES:
patent: 5055367 (1991-10-01), Law
patent: 6391505 (2002-05-01), Hamasaki et al.
patent: 1 340 755 (2003-09-01), None
patent: 58-173748 (1983-10-01), None
patent: 2000-113504 (2000-04-01), None
patent: WO 02/40479 (2002-05-01), None
patent: WO 03095453 (2003-11-01), None
Kim Beom-jun
Kim Seung-ju
Lee Hwan-koo
Yokota Saburo
Yon Kyung-yol
RoDee Christopher
Roylance Abrams Berdo & Goodman L.L.P.
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