Drug – bio-affecting and body treating compositions – Designated organic active ingredient containing – Having -c- – wherein x is chalcogen – bonded directly to...
Reexamination Certificate
2006-08-01
2006-08-01
Powers, Fiona T. (Department: 1626)
Drug, bio-affecting and body treating compositions
Designated organic active ingredient containing
Having -c-, wherein x is chalcogen, bonded directly to...
C546S343000
Reexamination Certificate
active
07084149
ABSTRACT:
A composition containing a compound of the formula:wherein A is a nitrogen-containing heterocyclic group which may be substituted, R1is a hydrogen atom, hydrocarbon group which may be substituted, or monocyclic aromatic heterocyclic group which may be substituted, R2is a hydrogen atom or a lower alkyl group which may be substituted, R3, R4, R5, R6, R7, R8and R9are independently a hydrogen atom, a hydrocarbon group which may be substituted, a hydroxy group which may be substituted, a thiol group which may be substituted, an amino group which may be substituted, an acyl group or a halogen atom, a salt thereof or a prodrug thereof has steroid C17,20-lyase inhibitory activity, and are useful for preventing and treating a mammal suffering from, for example, primary cancer of malignant tumor, its metastasis and recurrence thereof.
REFERENCES:
patent: 3759934 (1973-09-01), Houlihan
patent: 4727078 (1988-02-01), Terao et al.
patent: 4734406 (1988-03-01), Lau et al.
Golub et al., Science 286, 531-537, Oct. 1999.
Kaku Tomohiro
Kusaka Masami
Ojida Akio
Tasaka Akihiro
Yamaoka Masuo
Chao Mark
Powers Fiona T.
Ramesh Elaine M.
Takeda Pharmaceutical Company Limited
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