Nanowire MOSFET with doped epitaxial contacts for source and...

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Ballistic transport device

Reexamination Certificate

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C257S347000, C257SE29245, C257SE29286

Reexamination Certificate

active

07999251

ABSTRACT:
A FET structure with a nanowire forming the FET channel, and doped source and drain regions formed by radial epitaxy from the nanowire body is disclosed. A top gated and a bottom gated nanowire FET structures are discussed. The source and drain fabrication can use either selective or non-selective epitaxy.

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