Etching a substrate: processes – Forming or treating an article whose final configuration has...
Reexamination Certificate
2006-05-30
2006-05-30
Ahmed, Shamim (Department: 1765)
Etching a substrate: processes
Forming or treating an article whose final configuration has...
C216S041000, C430S322000, C977S700000, C977S773000
Reexamination Certificate
active
07052618
ABSTRACT:
Nanostructures and methods of making the same are described. In one aspect, a film including a vector polymer comprising a payload moiety is formed on a substrate. The film is patterned. Organic components of the patterned film are removed to form a payload-comprising nanoparticle.
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Lu Jennifer Q.
Moll Nicolas J.
Roitman Daniel B.
Agilent Technologie,s Inc.
Ahmed Shamim
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