Nanostructures and methods of making the same

Etching a substrate: processes – Forming or treating an article whose final configuration has...

Reexamination Certificate

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C216S041000, C430S322000, C977S700000, C977S773000

Reexamination Certificate

active

07052618

ABSTRACT:
Nanostructures and methods of making the same are described. In one aspect, a film including a vector polymer comprising a payload moiety is formed on a substrate. The film is patterned. Organic components of the patterned film are removed to form a payload-comprising nanoparticle.

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