Organic compounds -- part of the class 532-570 series – Organic compounds – Silicon containing
Reexamination Certificate
2001-10-09
2008-03-04
Kumar, Shailendra (Department: 1621)
Organic compounds -- part of the class 532-570 series
Organic compounds
Silicon containing
C556S400000, C556S466000, C556S470000
Reexamination Certificate
active
07339068
ABSTRACT:
The present invention provides a process for using nanosized copper, nanosized copper oxides, nanosized copper chlorides, other nanosized copper salts, and mixtures thereof, as sources of catalytic copper in the Direct Synthesis of trialkoxysilanes of the formula HSi(OR)3wherein R is an alkyl group containing from 1 to 6 carbon atoms inclusive. The nanosized copper, nanosized copper oxides, nanosized copper chlorides, other nanosized copper salts, and their mixtures of this invention have average particle sizes that are in the range from about 0.1 to about 600 nanometers, preferably from about 0.1 to about 500 nanometers, and most preferably from about 0.1 to about 100 nanometers. Nanosized sources of catalytic copper afford high dispersion of catalytic sites on silicon and contribute to high reaction rates, high selectivity and high silicon conversion. The nanosized copper catalyst precursors of the invention permit the use of substantially reduced levels of copper compared to conventional practice.
REFERENCES:
patent: 3505379 (1970-04-01), Bonltz et al.
patent: 3641077 (1972-02-01), Rochow
patent: 3775457 (1973-11-01), Muraoka et al.
patent: 4727173 (1988-02-01), Mendicino
patent: 5362897 (1994-11-01), Harada et al.
patent: 5527937 (1996-06-01), Standke et al.
patent: 5728858 (1998-03-01), Lewis et al.
patent: 5783720 (1998-07-01), Mendicino et al.
patent: 6258970 (2001-07-01), Ward, III et al.
patent: 2002/0010354 (2002-01-01), Brand
patent: 0 835 876 (1998-04-01), None
patent: 1 157 993 (2001-11-01), None
patent: 1 172 366 (2002-01-01), None
patent: 49 055625 (1974-05-01), None
patent: 80 76891 (1980-06-01), None
patent: 1980-2641 (1981-08-01), None
patent: 1980-28928 (1981-10-01), None
patent: 1980-28929 (1981-10-01), None
patent: 57108094 (1982-07-01), None
patent: 62 96433 (1987-05-01), None
patent: 10182660 (1998-07-01), None
patent: HEI 11-21288 (1999-01-01), None
patent: WO 01/47937 (2001-07-01), None
Brunauer, Stephen, Emmett, P. H., and Teller, Edward, Adsorption of Gases in Multimolecular Layers, (1938), pp. 309-319, vol. 60, U.S.A.
Suzuki et al., Bulletin of the Chemical Society of Japan, (1994), pp. 3445-3447, vol. 1, Japan.
Cromer Sabrina R.
Eng Regina Nelson
Lewis Kenrick M.
Mereigh Abellard T.
O'Young Chi-Lin
Kumar Shailendra
Momentive Performance Materials Inc.
Vicari Dominick G.
LandOfFree
Nanosized copper catalyst precursors for the direct... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Nanosized copper catalyst precursors for the direct..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Nanosized copper catalyst precursors for the direct... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3965300