X-ray or gamma ray systems or devices – Source
Reexamination Certificate
2004-11-05
2009-02-17
Kao, Chih-Cheng G (Department: 2882)
X-ray or gamma ray systems or devices
Source
C250S50400H
Reexamination Certificate
active
07492867
ABSTRACT:
Methods, systems and apparatus for using nanoparticle seeded short-wavelength discharge generator sources discharge sources, for use with X-ray, XUV and EUV light emissions. Applications can include EUV lithography. Additional embodiments can use the generator sources for Hollow Cathode Plasma Discharge (HCPD) lamps, and dense plasma focus (DPF) devices and other sources. Target streams of gases such as Xe and nanoparticles such as tin, copper, or lithium can be heated with laser type sources to emit nano-droplets therefrom.
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Kao Chih-Cheng G
Law Offices of Brian S. Steinberger , P.A.
Steinberger Brian S.
University of Central Flordia Research Foundation, Inc.
Wood Phyllis K.
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