Nanolithography methods and products therefor and produced...

Details Nanolithography methods and products therefor and produced... Nanolithography methods and products therefor and produced...

2011-02-15

2011-02-15

Fletcher, III, William Phillip (Department: 1792)

Coating processes

Nonuniform coating

Applying superposed diverse coatings or coating a coated base

C427S270000, C427S271000, C427S355000, C977S856000, C977S857000, C977S863000, C977S884000, C977S885000, C977S886000

Reexamination Certificate

active

07887885

ABSTRACT:
The invention provides methods of nanolithography and products therefor and produced thereby. In particular, the invention provides a nanolithographic method referred to as high force nanografting (HFN). HFN utilizes a tip (e.g., a scanning probe microscope (SPM) tip such as an atomic force microscope (AFM) tip) to pattern a substrate passivated with a resist. In the presence of a patterning compound, the tip is used to apply a high force to the substrate to remove molecules of the resist from the substrate, whereupon molecules of the patterning compound are able to attach to the substrate the form the desired pattern.

REFERENCES:
patent: 4968585 (1990-11-01), Albrecht et al.
patent: 5138174 (1992-08-01), Tang
patent: 5363697 (1994-11-01), Nakagawa
patent: 5472881 (1995-12-01), Beebe et al.
patent: 5503980 (1996-04-01), Cantor
patent: 5630923 (1997-05-01), Aga et al.
patent: 5666190 (1997-09-01), Quate et al.
patent: 5747334 (1998-05-01), Kay et al.
patent: 5753814 (1998-05-01), Han et al.
patent: 5831181 (1998-11-01), Majumdar et al.
patent: 5846909 (1998-12-01), McDevitt et al.
patent: 5874668 (1999-02-01), Xu et al.
patent: 5908692 (1999-06-01), Hamers et al.
patent: 5922214 (1999-07-01), Liu et al.
patent: 5942397 (1999-08-01), Tarlov et al.
patent: 5962736 (1999-10-01), Zambias et al.
patent: 5985356 (1999-11-01), Schultz et al.
patent: WO 96/31625 (1996-10-01), None
patent: WO 98/04740 (1998-02-01), None
patent: WO 99/31267 (1999-06-01), None
patent: WO 99/48682 (1999-09-01), None
patent: WO 00/04382 (2000-01-01), None
patent: WO 00/04389 (2000-01-01), None
patent: WO 00/04390 (2000-01-01), None
patent: WO 00/36136 (2000-06-01), None
patent: WO 00/41213 (2000-07-01), None
patent: WO 00/46406 (2000-08-01), None
patent: WO 01/00876 (2001-01-01), None
patent: WO 01/51665 (2001-07-01), None
Liu et al., “Patterning Surfaces Using Tip-Directed Displacement and Self-Assembly,” Langmuir 2000, 16, 3006-3009.
Xu et al., “Nanometer-Scale Fabrication by Simultaneous Nanoshaving and Molecular Self-Assembly,” Langmuir 1997, 13, 127-129.
Xu et al., “Fabrication of Nanometer Scale Patterns within Self-Assembled Monolayers by Nanografting,” Langmuir 1999, 15, 7244-7251.
Hong et al., “Multiple Ink Nanolithography: Toward a Multiple-Pen Nano-Plotter,” Science 286, 523 (1999).
Amro et al., “Patterning Surfaces Using Tip-Directed Displacement and Self-Assembly,” Langmuir 2000, 16, 3006-3009.
Liu et al., “Nanofabrication of Self-Assembled Monolayers Using Scanning Probe Lithography,” Acc. Chem. Res. 2000, 33, 457-466.
Schwartz, “Meniscus Force Nanografting: Nanoscopic Patterning of DNA”, Langmuir, Aug. 2001, vol. 17, No. 19, pp. 5971-5977.
International Search Report for International (PCT) Patent Application No. PCT/US01/50958, mailed Jun. 13, 2002.
International Preliminary Examination Report for International (PCT) Patent Application No. PCT/US01/50958, completed Feb. 5, 2003.
Abbott et al., Science, 257, 1380-1382 (1992).
Allara and Nuzzo, Langmuir, 1, 45 (1985).
Anwander et al., J. Phys. Chem. B, 104, 3532 (2000).
Bain, Adv. Mater. (Weinheim, Fed. Repub. Ger.), 4, 591-4 (1992).
Bansal et al., J. Phys. Chem. B, 102, 1067-1070 (1998).
Bansal et al., J. Phys. Chem. B, 102, 4058-4060 (1998).
Bernard et al., Langmuir, 14, 2225-2229 (1998).
Bottomley, Anal. Chem., 70:425R (1998).
Brazdil et al. J. Phys. Chem., 85, 1005-14 (1981).
Calvert, J. Vac. Sci. Technol. B, 11, 2155-2163 (1993).
Chang et al., Am. Chem. Soc., 116, 6792-805 (1994).
Chen et al., J. Am. Chem. Soc., 117, 6374-5 (1995).
Chen et al., Langmuir, 12, 2622-2624 (1996).
Chen et al., Langmuir, 15, 1075-1082 (1999).
Demers, C. A. Mirkin. R. C. Mucic, R. A. Reynolds, R. 1. Letsinger, Anal. Chem., submitted (2000).
Dubois and Nuzzo, Annu. Rev. Phys. Chem., 43, 437-63 (1992).
Edelstein et al. Biosensors and Bioelectronics 14, 805 (2000).
Elghanian, J.J. Storhoff, R.C. Mucic, R.L. Letsinger, C.A.Mirkin. Science, 277, 1078 (1997).
Ellison et al., J. Phys. Chem. B, 102, 8510-8518 (1998).
Ellison et al., J. Phys. Chem. B, 103, 6243-6251 (1999).
Eltekova and Eltekov, Langmuir, 3, 951 (1987).
Fenter et al., Langmuir, 7, 2013-16 (1991).
Fodor, Science 227, 393 (1997).
Frisbie et al., Science, 265, 2071-2074 (1994).
George et al., J. Am. Chem. Soc., 120, 1267 (1998).
Grabar et al., Anal. Chem., 67, 735-743.
Gu et al., J. Phys. Chem. B, 102, 9015-9028 (1998).
Gui et al., Langmuir, 7, 955-63 (1991).
Hamers et al., J. Phys. Chem. B, 101, 1489-1492 (1997).
Herne, M. J. Tarlov, J. Am. Chem. Soc. 119, 8916 (1997).
Henderson et al., Inorg. Chim. Acta, 242, 115-24 (1996).
Hickman et al., J. Am. Chem. Soc., 111, 7271 (1989).
Hickman et al., Langmuir, 8, 357-9 (1992).
Hidber et al., Langmuir, 12, 5209-5215 (1996).
Hong et al., Science, 286, 523-528 (1999).
Hovis et al., J. Phys. Chem. B, 101, 9581-9585 (1997).
Hovis et al., J. Phys. Chem. B, 102, 6873-6879 (1998).
Hovis et al., Surf. Sci., 402-404, 1-7 (1998).
Hubbard, Acc. Chem. Res., 13, 177 (1980).
Huc et al., J. Phys. Chem. B, 103, 10489-10495 (1999).
Huck et al., Langmuir, 15, 6862-6867 (1999).
Jarvis et al., Rev. Sci. Instrum, 67, 2281-2286 (1996).
Lahiri et al., Langmuir, 15, 2055-2060 (1999).
Laibinis et al., J. Am. Chem. Soc., 114, 1990-5 (1992).
Laibinis et al., Langmuir, 7, 3167-73 (1991).
Lee et al., J. Phys. Chem., 92, 2597 (1988).
Li et al., J. Phys. Chem., 98, 11751-5 (1994).
Lindsay et al., J. Vac. Sci. Technol. A., 11, 808-815 (1993).
Lo et al., J. Am. Chem. Soc., 118, 11295-11296 (1996).
Lunt et al., J. Appl. Phys., 70, 7449-67 (1991).
Lunt et al., J. Vac. Sci. Technol., B, 9, 2333-6 (1991).
Lutwyche et al., Sens. Actuators a, 73:89 (1999).
Maoz and Sagiv, Langmuir, 3, 1034 (1987).
Maoz and Sagiv, Langmuir, 3, 1045 (1987).
Matteucci and Caruthers, J. Am. Chem. Soc., 103, 3185-3191 (1981).
Mayya et al., J. Phys. Chem. B, 101, 9790-9793 (1997).
Menzel et al., Adv. Mater. (Weinheim, Ger.), 11, 131-134 (1999).
Meyer et al., J. Am. Chem. Soc., 110, 4914-18 (1988).
Minne et al., Appl. Phys. Lett., 73:1742 (1998).
Mirkin et al., Adv. Mater. (Weinheim, Ger.), 9, 167-173 (1997).
Mirkin et al., Chemphyschem., 2, 37-39 (2001).
Mirkin Inorg. Chem. 39, 2258-2272 (2000).
Mirkin, Mrs Bull., 25, 43 (2000).
Mucic et al. Chem. Commun. 555-557 (1996).
Mucic et al., J. Am. Chem. Soc., 120(48), pp. 12674-12675 (1998).
Muller et al., J. Vac. Sci. Technol. B, 13:2846 (1995).
Muller et al., Science, 268, 272 (1995).
Nakagawa et al., Jpn. J. Appl. Phys., Part 1, 30, 3759-62 (1991).
Noy et al., J. Am. Chem. Soc., 117, 7943-7951 (1995).
Noy et al., Langmuir, 14, 1508-1511 (1998).
Nuzzo et al., J. Am. Chem. Soc., 109, 2358 (1987).
Nyffenegger et al., Chem. Rev., 97:1195 (1997).
Patil et al., Langmuir, 14, 2707-2711 (1998).
Pereira et al., J. Mater. Chem., 10, 259 (2000).
Perkins et al., Appl. Phys. Lett., 68:550 (1996).
Piner et al., Science, 283, 661-663 (1999).
Porter et al., Langmuir, 14, 7378-7386 (1998).
Ross et al., Langmuir, 9, 632-636 (1993).
Sastry et al., J. Phys. Chem. B, 101, 4954-4958 (1997).
Schoer et al., Langmuir, 13:2323 (1997).
Sheen et al., J. Am. Chem. Soc., 114, 1514-15 (1992).
Slavov et al., J. Phys. Chem., 104, 983 (2000).
Solomun et al., J. Phys. Chem., 95, 10041-9 (1991).
Son et al., J. Phys. Chem., 98, 8488-93 (1994).
Song, J. H., Thesis, University of California at San Diego (1998).
Soriaga and Hubbard, J. Am. Chem. Soc., 104, 3937 (1982).
Steiner et al., Langmuir, 8, 2771-7 (1992).
Steiner et al., Langmuir, 8, 90-4 (1992).
Stewart et al., Rev. Sci. Instrum, 63, 5626-5635 (1992).
Storhoff et al., J. Am. Chem. Soc., 120, 1959 (1998).
Sugimura et al., J. Vac. Sci. Technol. A, 14:1223 (1996).
Tao, J. Am. Chem. Soc., 115, 4350-4358 (1993).
Taton, C. A. Mirkin, R. L. Letsinger, Science in press to appear Sep. 8, 2000.
Teal, IEEE Trans. Electron Dev. Ed-23, 621 (1976).
Timmons and Zisman, J. Phys. Chem., 69, 984-990 (1965).
Tsukamoto et al., Rev. Sci. Instrum., 62:1767 (1991).
Ulman, Chem. Rev., 96:1533 (1996).
Vettiger et al., Microelectron Eng., 46:11 (1999).
Walczak et al., J. Am. Chem. Soc., 1

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