Nanolithography and microlithography devices and method of...

Details Nanolithography and microlithography devices and method of... Nanolithography and microlithography devices and method of...

2005-03-10

2008-08-19

Nguyen, Nam X (Department: 1795)

Chemistry: electrical and wave energy

Apparatus

Electrolytic

C204S22400M, C156S060000

Reexamination Certificate

active

07413638

ABSTRACT:
A lithography device includes one or more conductive strips monolithically embedded within an insulative structure. A method of manufacturing a lithography device includes monolithically forming a conductive strip through an insulative structure. Monolithically forming such a device includes forming the conductive strip on an mixed conductive-insulative layer, and embedding the conductive-insulative layer layer within the insulative structure. Such a device may readily be manufactured, is reliable, and is capable of various lithography applications and other applications requiring sub-micron and nano-scale electrode devices and electrode arrays.

REFERENCES:
patent: 3259475 (1966-07-01), Burnham
patent: 4606787 (1986-08-01), Pelligrino
patent: 6423193 (2002-07-01), Miller et al.
patent: 2004/0129578 (2004-07-01), McLachlan et al.

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