Nanoimprint lithography

Details Nanoimprint lithography Nanoimprint lithography

1995-11-15

1998-06-30

Breneman, R. Bruce

Etching a substrate: processes

Masking of a substrate using material resistant to an etchant

Mechanically forming pattern into a resist

216 52, 216 53, 438691, 438700, 438735, H01L 21304

Patent

active

057729050

ABSTRACT:
A lithographic method and apparatus for creating ultra-fine (sub-25 nm) patterns in a thin film coated on a substrate is provided, in which a mold having at least one protruding feature is pressed into a thin film carried on a substrate. The protruding feature in the mold creates a recess of the thin film. The mold is removed from the film. The thin film then is processed such that the thin film in the recess is removed exposing the underlying substrate. Thus, the patterns in the mold is replaced in the thin film, completing the lithography. The patterns in the thin film will be, in subsequent processes, reproduced in the substrate or in another material which is added onto the substrate.

REFERENCES:
patent: 3743842 (1973-07-01), Smith et al.
patent: 4310743 (1982-01-01), Seliger
patent: 4325779 (1982-04-01), Rossetti
patent: 4383026 (1983-05-01), Hall
patent: 4450358 (1984-05-01), Reynolds
patent: 4498009 (1985-02-01), Reynolds
patent: 4516253 (1985-05-01), Novak
patent: 4552615 (1985-11-01), Amendola et al.
patent: 4576678 (1986-03-01), Shibata
patent: 4606788 (1986-08-01), Moran
patent: 4731155 (1988-03-01), Napoli et al.
patent: 4832790 (1989-05-01), Rossetti
patent: 5277749 (1994-01-01), Griffith et al.
"Moire Alignment Technique for the Mix and Match Lithographic System," American Vacuum Society, by Tsutomu Nomura, Seiichiro Kimura, Yoshiyuku Uchida and Shuzo Hattori, Jan./Feb. 1988 pp. 394-398.
"An Alignment Technique Using Diffracted Moire Signals," American Vacuum Society, by Kenji Hara, Yoshiiyuki Uchida, Tsutomu Nomura, Seiichiro Klmura, Dai Sugimoto, Akihiro Yoshida, Hiroshi Miyake, Takahide Lida and Shuzo Hattori, Nov./Dec. 1989, pp. 1977-1979.
"Molding of Plastic Components Using Micro-Dem Tools," Electronics Manufacturing Technology Symposium, by Hong Li and Stephen D. Senturia, 1992, pp. 145-149.
"10 nm Electron Beam Lithography and Sub-50 nm Overlay Using a Modified Scanning Electron Microscope," American Institute of Physics, by P. B. Fischer and S. Y. Chou, 1993, pp. 2989-2991. Jun. 1993.
"250-A Linewidths and PMMA Electron Resist," American Institute of Physics, by A. N. Broere, J. M. E. Harper, and W. W. Moizen, 1978, pp. 392-394. Sep. 1978.
"Molding of Threedimensional Microstructures by the Liga Process," IEEE by M. Harmening, W. Bacher, P. Bley, A. El-Khali, H. Kalb, B. Kowanz, W. Menz, A Michel and J. Mohr, 1992, pp. 202-207. Feb. 1972.

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