Nanoimprint lithograph for fabricating nanoadhesive

Details Nanoimprint lithograph for fabricating nanoadhesive Nanoimprint lithograph for fabricating nanoadhesive

2005-11-03

2008-11-11

Ahmed, Shamim (Department: 1792)

Etching a substrate: processes

Pattern or design applied by transfer

C216S041000, C216S052000, C264S219000, C101S483000

Reexamination Certificate

active

07449123

ABSTRACT:
A nanoimprint lithography method of fabricating a nanoadhesive includes steps of (a) preparing a substrate and a transfer stamp, said transfer stamp having a transfer face and nanometer-scale features formed on said transfer face, said nanometer-scale features having a plurality of convexities and concavities, said substrate having an etched layer; (b) proceeding a staining process to enable either of said convexities and concavities to be stained with a photoresist; (c) proceeding a transfer process to enable said nanometer-scale features to touch said etched layer to transfer said photoresist onto said etched layer; and (d) proceeding an etching process to enable parts of said etched layer that are not stained with the photoresist to be each etched for a predetermined depth. As the steps indicated above, the nanoadhesive can be produced with mass production and low cost.

REFERENCES:
patent: 6792856 (2004-09-01), Hall et al.
patent: 6946332 (2005-09-01), Loo et al.
patent: 7218465 (2007-05-01), Deeman et al.
patent: 2002/0130444 (2002-09-01), Hougham
patent: 2005/0120902 (2005-06-01), Adams et al.
patent: 2005/0133954 (2005-06-01), Homola

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