Nano-tip fabrication by spatially controlled etching

Details Nano-tip fabrication by spatially controlled etching Nano-tip fabrication by spatially controlled etching

2006-05-17

2008-10-07

Chen, Kin-Chan (Department: 1765)

Etching a substrate: processes

Gas phase etching of substrate

C216S067000

Reexamination Certificate

active

07431856

ABSTRACT:
A method of fabricating nano-tips involves placing a precursor nanotip with an apex and shank in a vacuum chamber; optionally applying an electric field to the precursor nanotip to remove oxide and other contaminant species; subsequently admitting an etchant gas to the vacuum chamber to perform field assisted etching by preferential adsorption of the etchant gas on the shank; and gradually reducing the applied electric field to confine the adsorption of the etchant gas to the shank as etching progresses.

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