Nano-particles and process for producing nano-particles

Plastic and nonmetallic article shaping or treating: processes – Formation of solid particulate material directly from molten...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

10738092

ABSTRACT:
It is an object of the present invention to provide a process for producing nano-particles, capable of efficiently producing monodisperse nano-particles substantially uniform in particle size and composition, and freely controllable in particle size and composition at low cost. The process for producing nano-particles comprises a particle precursor capturing step in which a liquid containing the particle precursor is incorporated in another liquid containing dendritic branching molecules to capture the particle precursor by the dendritic branching molecule, and particle forming step in which the particle precursor captured by the dendritic branching molecule is transformed into the particle.

REFERENCES:
patent: 2002/0068795 (2002-06-01), Won et al.
patent: 2002-179820 (2002-06-01), None
patent: 2006-225668 (2006-08-01), None
patent: 2006-225669 (2006-08-01), None
patent: 2006-273936 (2006-10-01), None
patent: WO 98/30604 (1998-07-01), None
Hong Xie et al., “Dendrimer-mediated synthesis of platinum nanoparticles: new insights from dialysis and atomic force microscopy measurements”, Nanotechnology 16 (2005) S492-S501.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Nano-particles and process for producing nano-particles does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Nano-particles and process for producing nano-particles, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Nano-particles and process for producing nano-particles will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3884429

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.