Nano-lithography using squeezed atomic and molecular states

Details Nano-lithography using squeezed atomic and molecular states Nano-lithography using squeezed atomic and molecular states

2005-05-10

2005-05-10

Lee, John R. (Department: 2881)

Radiant energy

Electrically neutral molecular or atomic beam devices and...

Reexamination Certificate

active

06891152

ABSTRACT:
A method and apparatus for performing atomic and molecular nano-deposition by means of atomic or molecular focusing through a plurality of optical standing waves. A stacked set of standing light waves, preferably arranged as gratings in a predetermined form and of predetermined intensities, is used to sequentially compress or squeeze the width of the incident atomic or molecular beam into ultra-narrow, spatially localized spots or lines. The result is a focused beam of particles with improved resolution compared with prior art atomic focusing. Furthermore, spherical and chromatic aberrational effects can be reduced.

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