Nano icrystals copper material with super high strength and...

Metal treatment – Stock – Copper base

Reexamination Certificate

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C148S433000, C148S434000, C148S435000, C148S436000, C420S469000, C420S470000, C420S471000, C420S472000, C420S473000, C420S474000, C420S475000, C420S476000, C420S477000, C420S478000, C420S479000, C420S480000, C420S481000, C420S482000, C420S483000, C420S484000, C420S485000, C420S486000, C420S487000, C420S488000, C420S489000, C420S490000, C420S491000, C420S492000, C420S493000, C420S494000, C420S495000, C420S496000, C420S497000, C420S498000, C420S499000, C420S500000

Reexamination Certificate

active

07736448

ABSTRACT:
The present invention relates to a nanocrystalline metallic material, particularly to nano-twin copper material with ultrahigh strength and high electrical conductivity and its preparation method. High-purity polycrystalline Cu material with a microstructure of roughly equiaxed submicron-sized grains (300-1000 nm) has been produced by pulsed electrodeposition technique, by which high density of growth-in twins with nano-scale twin spacing were induced in the grains. Inside each grain, there are high densities of growth-in twin lamellae. The twin lamellae with the same orientations are inter-parallel, and the twin spacing ranges from several nanometers to 100 nm with a length of 100-500 nm. This Cu material invented has more excellent performance than existing ones. The tensile yield strength and ultimate strength of the present Cu material at room-temperature can be as high as 900 MPa and 1086 MPa, respectively, and such a high tensile strength can not be achieved for the Cu materials with the same chemical composition prepared by any traditional methods. Meanwhile, the present Cu sample also keeps a good electrical conductivity, for example, the room-temperature resistivity is (1.75±0.02)×10−8Ω·m, corresponding to 96% IACS, which is close to that of the conventional coarse-grained Cu.

REFERENCES:
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patent: 1181224 (2004-12-01), None
Lyttle, Mark T.;Hughes, D.A., Nano0Lamellar Structures in a Rolled Cu-Ag Alloy, Materials Research Society Symposium Proceedings (2001), 683 E(Material Instabilities and Patterning in Metals), No pp. given, Paper #:BBI.4 CODEN: MRSPDH; ISSN: 0272-9172.
P.G. Sanders, et al., “Elastic and Tensile Behavior of Nanocrystalline Copper and Palladium”, Acta Mater, vol. 45, No. 10, pp. 4019-4025 (1997).
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M. Legros, et al., “Microsample Tensile Testing of Nanocrystalline Metals”, Philosophical Magazine A, 2000, vol. 80, No. 4, pp. 1017-1026.
Y.M. Wang, et al., “Microsample Tensile Testing of Nanocrystalline Copper”, Scripta Mater, 48 (2003) pp. 1581-1586.
R.K. Islamgaliev et al., “The Determination of the Grain Boundary Width of Ultrafine Grained Copper and Nickel from Electrical Resistivity Measurements”, Phys. Stat. Sol. (a), 162, pp. 559-566 (1997).
Notification Concerning Submission or Transmittal of Priority Document (Form PCT/IB/304) issued in connection with PCT/CN03/00867.
Abstract for CN 1389597 having a publication date of Jan. 8, 2003 for invention entitled “High-strength and high-conductivity nanometer crystal copper material and its prepn”.

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