Etching a substrate: processes – Gas phase etching of substrate
Reexamination Certificate
2006-11-09
2010-12-21
Vinh, Lan (Department: 1713)
Etching a substrate: processes
Gas phase etching of substrate
C216S031000, C216S080000, C438S723000
Reexamination Certificate
active
07854853
ABSTRACT:
An exemplary embodiment of the present invention provides a nano fabrication method for a glass, the method including forming a molecule substituting layer on a glass substrate, patterning the molecule substituting layer correspondent to shapes to be patterned on the glass substrate, substituting crystal atoms of the glass substrate with atoms of the molecule substituting layer, removing the patterned molecule substituting layer from the glass substrate, and etching the molecule substituted portion of the glass substrate.
REFERENCES:
patent: 3370948 (1968-02-01), Rosenbauer
patent: 7179527 (2007-02-01), Sato et al.
patent: 7399681 (2008-07-01), Couillard et al.
patent: 2002/0014263 (2002-02-01), Sasaki
Kim Pan-Kyeom
Lim Geun-Bae
Marshall & Gerstein & Borun LLP
Postech Academy-Industry Foundation
Vinh Lan
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