NAND flash memory device and method of manufacturing and...

Static information storage and retrieval – Floating gate – Particular connection

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C365S185170, C365S185110

Reexamination Certificate

active

11275282

ABSTRACT:
A NAND flash memory device, and more particularly, to NAND flash memory device and method of manufacturing operating the same as described. A dielectric film and a conduction layer are formed between cell gates so that between-cell gates are buried. Therefore, an interference effect between floating gates, which becomes profound with the level of integration increasing, and program threshold voltage distributions between cells can be improved.

REFERENCES:
patent: 5473563 (1995-12-01), Suh et al.
patent: 5953254 (1999-09-01), Pourkeramati
patent: 6034894 (2000-03-01), Maruyama et al.
patent: 6121670 (2000-09-01), Hisamune
patent: 6218689 (2001-04-01), Chang et al.
patent: 6243295 (2001-06-01), Satoh
patent: 6512253 (2003-01-01), Watanabe et al.
patent: 6512262 (2003-01-01), Watanabe
patent: 6756631 (2004-06-01), Wu
patent: 6819592 (2004-11-01), Noguchi et al.
patent: 6910013 (2005-06-01), Allegro et al.
patent: 6925008 (2005-08-01), Ichige et al.
patent: 7082055 (2006-07-01), Ichige et al.
patent: 1996-0036047 (1998-12-01), None
patent: 1997-0072400 (1999-02-01), None
patent: 2004-0035569 (2004-04-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

NAND flash memory device and method of manufacturing and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with NAND flash memory device and method of manufacturing and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and NAND flash memory device and method of manufacturing and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3835749

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.