Nail varnish

Drug – bio-affecting and body treating compositions – Manicure or pedicure compositions

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C424S401000

Reexamination Certificate

active

07455831

ABSTRACT:
Disclosed herein is a nail varnish composition comprising, in a cosmetically acceptable medium, at least one film-forming polymer, wherein the varnish composition is capable of forming a film having a rate of mass loss of less than 0.5 mg/minute when the film is subjected to abrasion produced with the Taber abrasimeter at 23° C., as well as a method for making up and/or non-therapeutic care of the nails comprising applying to the nails the composition.

REFERENCES:
patent: 5681550 (1997-10-01), Rubino
patent: 6113925 (2000-09-01), de la Poterie
patent: 2004/0071644 (2004-04-01), Mougin et al.
patent: 0 658 609 (1995-06-01), None
patent: 0 898 958 (1999-03-01), None
patent: 0 898 960 (1999-03-01), None
patent: 2 814 674 (2002-04-01), None
patent: 2 819 176 (2002-07-01), None
patent: WO 02 39962 (2002-05-01), None
J.M. Buist et al., “Advances in Polyurethane Technology,” p. 286, pp. 296-297, 1968.
H.F. Mark et al., “Encyclopedia of polymer science and engineering,” 2ndEd. vol. 13, pp. 294-296.
English language Derwent Abstract of EP 0 898 958 B1.
English language Derwent Abstract of EP 0 898 960 B1.
English language Derwent Abstract of FR 2 819 176 A1.
English language Derwent Abstract of FR 2 814 674 A1.
French Search Report for FR 02/08556, Examiner Glikman, Apr. 11, 2003.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Nail varnish does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Nail varnish, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Nail varnish will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4031198

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.