N-vinyllactam derivatives and polymer thereof

Details N-vinyllactam derivatives and polymer thereof N-vinyllactam derivatives and polymer thereof

1996-09-12

1998-05-12

Bond, Robert T.

Organic compounds -- part of the class 532-570 series

Organic compounds

Heterocyclic carbon compounds containing a hetero ring...

540354, 540358, 540252, 540463, 540451, 540485, 540487, 540524, 540525, 540526, 540531, 546 14, 546 21, 546243, 548110, 548111, 548544, 548545, 548551, 5253269, C07F 710, C08F 3008, G03C 160

Patent

active

057506809

ABSTRACT:
N-vinyllactam derivatives protected at the 3-position are provided and represented by the following formula (I). These are polymerized into homo- and copolymers for use in microlithography of semiconductor manufacture. The polymers are used as a photoresist material suitable for a deep UV process so that pictures of high sensitivity and high resolution can be obtained. In addition, ultrafine circuits can be formed and an exceptional improvement in pattern formation can be accomplished through the use of the photoresist of the invention. ##STR1##

REFERENCES:
patent: 4115128 (1978-09-01), Kita
patent: 4491628 (1985-01-01), Ito et al.

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