N-vinyllactam derivatives and polymer thereof

Details N-vinyllactam derivatives and polymer thereof N-vinyllactam derivatives and polymer thereof

1998-02-19

1999-09-21

Raymond, Richard L.

Organic compounds -- part of the class 532-570 series

Organic compounds

Unsubstituted hydrocarbyl chain between the ring and the -c-...

540525, 546 14, 546188, 548519, 548524, 548543, 5253269, 525419, 528323, 528354, C07D22310, C07D21136, C07D20700, C08F 2238

Patent

active

059556064

ABSTRACT:
N-vinyllactam derivatives protected at the 3-position are provided and represented by the following formula (I). These are polymerized into homo- and copolymers for use in microlithography of semiconductor manufacture. The polymers are used as a photoresist material suitable for a deep UV process so that pictures of high sensitivity and high resolution can be obtained. In addition, ultrafine circuits can be formed and an exceptional improvement in pattern formation can be accomplished through the use of the photoresist of the invention.

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