N-type window layer for a thin film solar cell and method of mak

Batteries: thermoelectric and photoelectric – Photoelectric – Cells

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136262, 136264, 136252, 438 85, 438 95, 20419229, H01L 31032, H01L 310272

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06040521&

ABSTRACT:
Transparent conductive ZnO films are formed at a high rate, are equal in performance to those formed by MOCVD and have a large area, while the influence of sputtering bombardment is reduced. A method for producing transparent conductive ZnO films is used to produce the window layer of a CIGS thin-film solar cell. A first conductive film functioning as an interface-protective film is formed on a high-resistance-buffer (interfacial) layer by low-output (100 W or lower) RF sputtering using a ZnO target while reducing sputtering bombardment. Second and third conductive films for the window layer are then formed by DC magnetron sputtering in steps using a ZnO--Al target in each step.

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