Multivariate monitoring method for plasma process machine

Details Multivariate monitoring method for plasma process machine Multivariate monitoring method for plasma process machine

2007-04-19

2011-12-27

Chowdhury, Tarifur (Department: 2886)

Optics: measuring and testing

With plural diverse test or art

Reexamination Certificate

active

08085390

ABSTRACT:
An advance process control (APC) system for a plasma process machine is provided, which includes at least an optical emission spectroscopy (OES) system and an APC analysis apparatus. The OES system is used for monitoring a testing object in the plasma process machine. The APC analysis apparatus is used for analyzing the data received from the OES system.

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