Multiprocessing sonic bath system for semiconductor wafers

Details Multiprocessing sonic bath system for semiconductor wafers Multiprocessing sonic bath system for semiconductor wafers

1992-08-18

1994-01-18

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

134 1, 134186, 134902, B08B 312

Patent

active

052793168

ABSTRACT:
A bath system for processing semiconductor wafers includes a container having walls with a sonic transducer mounted on the outside of one side wall which is oblique to the other side walls. The thickness of the one side wall permits sonic energy to pass therethrough to wafers held in a liquid bath. Liquid and gas are introduced into the housing from the bottom wall.

REFERENCES:
patent: 3873071 (1975-03-01), Tatebe
patent: 5071488 (1991-12-01), Takayama et al.

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