Multipole implantation-isotope separation ion beam source

Details Multipole implantation-isotope separation ion beam source Multipole implantation-isotope separation ion beam source

1980-12-24

1983-05-10

Anderson, Bruce C.

Radiant energy

Ion generation

Field ionization type

250427, 3133591, H01J 2700

Patent

active

043831770

ABSTRACT:
A plurality of magnetic pole pieces are arranged around the external wall of a high temperature plasma confining structure. The pole pieces are positioned between permanent magnets spaced from one another and the confining structure by distances calculated to produce a minimum field toward the center of the structure with an effective containing field around the periphery of the structure. The magnets and the pole pieces are cooled. An odd number of poles are employed such that the missing pole appears as a virtual pole at the extraction slit used for forming an ion beam for ion implantation. The resulting small package multipole plasma containment functions to provide higher beam current, longer source lifetime, higher voltage stability and reduces maintenance and cleaning operations, with the permanent magnets protected from high temperature and corrosive gases.

REFERENCES:
patent: 3178604 (1965-04-01), Eklund
patent: 3969646 (1976-07-01), Reader et al.
patent: 4259145 (1981-03-01), Harper et al.
patent: 4277939 (1981-07-01), Hyman
"Ion Sources for Ion Machining Applications", Kaufman et al., AIAA Journal, vol. 15 No. 6, Jun. 1977, pp. 843-847.
"Characteristics of the Berkeley Multicusp Ion Source", Ehlers et al., Rev. of Sci. Ins., vol. 50, No. 11, Nov. 1979, pp. 1353-1361.
"Measurement of Spiraling in a Magnetically Confined Electron Beam for Use in Collision Studies", Taylor et al., Rev. of Scientific Ins., vol. 45, No. 4, Apr. 1974, pp. 538-544.
"Modifications of a Sputter Ion Source for Van de Graaff Operation", Hirvonen, Nuclear Inst. and Methods, vol. 116, No. 1, Mar. 1974, pp. 9-11.

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