Multiple wavelength linear zone plate alignment apparatus and me

Details Multiple wavelength linear zone plate alignment apparatus and me Multiple wavelength linear zone plate alignment apparatus and me

1986-03-06

1987-11-03

Willis, Davis L.

Optics: measuring and testing

By polarized light examination

With birefringent element

356354, 356401, G01B 902, G01B 1127

Patent

active

047040335

ABSTRACT:
An optical alignment apparatus and method for a semiconductor lithography mask and wafer utilizes two monochromatic light sources of different wavelengths. The mask contains targets in the form of linear Fresnel zone plates and the wafer contains a reflecting grating. Incident illumination from the two light sources illuminates the mask targets and is reflected from the wafer gratings in various intensity depending on the physical characteristics of the wafer and mask layers and thicknesses and by the targets. A detector detects the strongest of the diffracted return beams from each of the monochromatic light sources and uses the strongest to align the targets and grating on the mask and wafer for more accurate printing of mask patterns on the wafer.

REFERENCES:
patent: 4311389 (1982-01-01), Fay et al.

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