Multiple variable shaped electron beam system with lithographic

Details Multiple variable shaped electron beam system with lithographic Multiple variable shaped electron beam system with lithographic

1998-01-09

1999-10-05

Westin, Edward P.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

25049222, 2504922, 250398, H01J 37304, H01J 37147

Patent

active

059628596

ABSTRACT:
A multiple beam direct write e-beam system employs a set of miniature beam writing modules acting in parallel, each of which employs the combination of a uniform magnetic field and a uniform parallel electric field to form an image of a low-brightness electron emitting surface and also to modify the shape of an initially square beam, thereby producing a set of separately and independently modified beams, in which emitters, beamshaping deflection electrodes and fine-deflection electrodes are formed by microlithographic techniques.

REFERENCES:
patent: 5359202 (1994-10-01), Yasuda et al.
patent: 5363021 (1994-11-01), MacDonald
patent: 5438207 (1995-08-01), Itoh et al.
Schneider et al., Journal of Vacuum Science and Technology, B 14(6), p. 3782, Jun. 1996.

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