Coating apparatus – Gas or vapor deposition
Patent
1996-11-27
1999-03-02
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
118726, 4272552, C23C 1600
Patent
active
058765034
ABSTRACT:
A system for the deposition of a multicomponent material layer on a substrate from respective liquid precursors for components of the multicomponent material layer, comprising: a vapor deposition zone; and multiple vaporizer units, each of which is joined (i) to at least one source of liquid precursor for supplying at least one liquid precursor thereto, and (ii) in vapor flow communication with the vapor deposition zone arranged to retain the substrate therein, for deposition on the substrate of vapor phase species from precursor vapor formed by vaporization of liquid precursors in the vaporizer units of the system.
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Roeder Jeffrey
Van Buskirk Peter C.
Advanced Technology & Materials Inc.
Breneman R. Bruce
Hultquist Steven J.
Lund Jeffrie R
Zitzmann Oliver A. M.
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