Multiple vacuum arc derived plasma pinch x-ray source

Details Multiple vacuum arc derived plasma pinch x-ray source Multiple vacuum arc derived plasma pinch x-ray source

1986-09-23

1988-06-14

Howell, Janice A.

X-ray or gamma ray systems or devices

Source

378121, 378122, H01J 3500

Patent

active

047517239

ABSTRACT:
With the intent of satisfying the requirement of x-ray lithography a plasma pinch x-ray source has been developed in which the initial plasma annulus is derived from a plurality of electrical arcs in vacuum. This gives a low mass liner for the standard imploding plasma liner configuration to emit suitable x-rays and has the capability of being fired at repetition rates of 10 pps or more. The simplicity of this source design is especially attractive for a commercial use environment.

REFERENCES:
patent: 4184078 (1980-01-01), Nagel et al.
patent: 4201921 (1980-05-01), McCorkle
patent: 4504964 (1985-03-01), Cartz et al.
patent: 4536884 (1985-08-01), Weiss et al.
patent: 4602376 (1986-07-01), Doucet et al.
patent: 4618971 (1986-10-01), Weiss et al.
patent: 4633492 (1986-12-01), Weiss et al.

Affiliated with

Also associated with

Rating

Multiple vacuum arc derived plasma pinch x-ray source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multiple vacuum arc derived plasma pinch x-ray source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multiple vacuum arc derived plasma pinch x-ray source will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-509696