Multiple stepped aperture repair of transparent photomask...

Details Multiple stepped aperture repair of transparent photomask... Multiple stepped aperture repair of transparent photomask...

2006-01-03

2006-01-03

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S394000

Reexamination Certificate

active

06982134

ABSTRACT:
A method for repairing a transparent photomask substrate and a transparent photomask substrate repaired in accord with the method employ when eliminating a defect within a transparent photomask substrate a multi-stepped aperture having a series of progressive steps which separate a series of progressive plateaus. Each plateau has a plateau width and a step height such as to enhance transparent photomask substrate transmittance within the multi-stepped aperture. The method provides for efficient repair of a transparent photomask substrate.

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patent: 6340543 (2002-01-01), Nagamura et al.
patent: 6436587 (2002-08-01), Ulrich et al.

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