Multiple step formation of conductive material layers

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

437193, 437 26, 357 71, H01L 21283

Patent

active

048085553

ABSTRACT:
A process of forming a conductive material layer in at least two steps by forming a conductive material layer from a plurality of thin layers of conductive material. The use of a two-step formation process for the conductive material layer permits process versatility in incorporating implantation steps and patterning steps between formation of the thin layers of conductive material. Direct transfer from dielectric layer formation to conductive material layer formation steps, and performing the intermediate process steps in the same piece of equipment as the thin conductive layer formation assists in adhesion of the thin layers to each other to form the total conductive material layer. The use of in situ doped semiconductor material, such as in situ doped polycrystalline silicon and in situ doped amorphous silicon reduces the exposure of other dopants that may be present to thermal cycles of high temperature, greater than 900.degree. C., that causes these dopants to migrate undesirably.

REFERENCES:
patent: 4142926 (1979-03-01), Morgan
patent: 4143178 (1979-03-01), Harada et al.
patent: 4151021 (1979-03-01), McElroy
patent: 4191603 (1980-03-01), Garbarino et al.
patent: 4322736 (1982-03-01), Sasaki et al.
patent: 4329706 (1982-05-01), Crowder et al.
patent: 4373250 (1983-02-01), Malwah
patent: 4403394 (1983-08-01), Shepard et al.
patent: 4443930 (1984-04-01), Hwang et al.
patent: 4488931 (1984-12-01), Pansana
patent: 4529619 (1985-07-01), Nemanich
patent: 4556897 (1985-12-01), Yorikane et al.
patent: 4581815 (1986-04-01), Cheung et al.
patent: 4619729 (1984-02-01), Johncock et al.
Ghandhi, VLSI Fabrication Principles, John Wiley & Sons, N.Y., 1981, pp. 432-439.
Ghandhi, Sorab, "VLSI Fabrication Principles", John Wiley & Sons, New York, pp. 458-461.
Japanese Kokai Patent No. 60-10718, English translation.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Multiple step formation of conductive material layers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multiple step formation of conductive material layers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multiple step formation of conductive material layers will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1366857

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.