Multiple stage reactor system

Details Multiple stage reactor system Multiple stage reactor system

1983-02-28

1983-10-25

Chiesa, Richard L.

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

With means applying electromagnetic wave energy or...

208169, 422197, 422216, 422218, B01J 812

Patent

active

044118694

ABSTRACT:
The reactor system of this invention comprises two or more vertically spaced or stacked reaction chambers each of which contains two or more vertically positioned annular-form catalyst-retaining sections existing side-by-side, each of said catalyst-retaining sections being defined by an inner tubular-form catalyst-retaining screen coaxially disposed within a vertically positioned outer tubular-form catalyst-retaining screen. Catalyst particles are movable through the resulting annular-form catalyst sections in a dense phase via gravity flow. A reactant stream is processed serially through said reaction chambers, and contacted with catalyst within said annular-form catalyst-retaining sections in a manner to promote uniform flow of reactants across said sections. The disclosed reactor system is of particular advantage with respect to a relatively low pressure hydrocarbon conversion process.

REFERENCES:
patent: 1982099 (1934-11-01), Hechenbleikner
patent: 2617718 (1952-11-01), Miller
patent: 2683654 (1954-07-01), Bergman
patent: 3692496 (1972-09-01), Greenwood et al.
patent: 3706536 (1972-12-01), Greenwood et al.
patent: 3725248 (1973-04-01), Greenwood et al.
patent: 3882015 (1975-05-01), Carson
patent: 3918930 (1975-11-01), Forbes et al.
patent: 4040794 (1977-08-01), Stone

Affiliated with

Also associated with

Rating

Multiple stage reactor system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multiple stage reactor system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multiple stage reactor system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-712366