Multiple size wafer vacuum chuck

Details Multiple size wafer vacuum chuck Multiple size wafer vacuum chuck

1999-05-18

2000-12-26

Smith, James G.

Work holders

With fluid means

Vacuum-type holding means

269900, B25B 1100

Patent

active

061646334

ABSTRACT:
A vacuum holding chuck is presented. The vacuum holding chuck of the present invention is particularly well suited for holding semiconductor wafers of multiple diameters during various testing and manufacturing operations. In an exemplary embodiment, the vacuum chuck comprises a body having a first surface and an opposing second surface, wherein the first surface includes first and second recessed circular platforms to receive wafers having first and second diameters, respectively. The second surface includes at least one recessed circular platform to receive a wafer having a third diameter. Each circular platform is defined at least in part by an annular shoulder and each circular platform further includes a vacuum trough which is connected to a vacuum source which when activated, evacuates the air from the vacuum trough and securely holds a wafer in place within the circular platform.

REFERENCES:
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patent: 4448404 (1984-05-01), Ogawa et al.
patent: 5191218 (1993-03-01), Mori et al.
patent: 5324012 (1994-06-01), Aoyama et al.
patent: 5564682 (1996-10-01), Tsuji
patent: 6032997 (2000-03-01), Elliott et al.

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