Multiple resist layer phase shift mask (PSM) blank and PSM...

Details Multiple resist layer phase shift mask (PSM) blank and PSM... Multiple resist layer phase shift mask (PSM) blank and PSM...

2011-03-15

2011-03-15

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000

Reexamination Certificate

active

07906252

ABSTRACT:
A PSM blank and method for forming a PSM using the PSM blank, the PSM blank including a light transmitting portion; an uppermost anti-reflection portion; a photosensitive layer stack on the anti-reflection portion comprising at least two photosensitive layers; wherein each photosensitive layer has a lower radiant energy exposure sensitivity compared to an underlying layer.

REFERENCES:
patent: 7396617 (2008-07-01), Rockwell et al.
patent: 2001/0006754 (2001-07-01), Okazaki et al.
patent: 2004/0009434 (2004-01-01), Lin et al.
patent: 2004/0043328 (2004-03-01), Lu
patent: 2005/0089763 (2005-04-01), Tan et al.
patent: 2005/0260504 (2005-11-01), Becker et al.

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