Multiple patterning technique using a single reticle

Details Multiple patterning technique using a single reticle Multiple patterning technique using a single reticle

2007-04-16

2011-12-06

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Plural exposure steps

C430S005000, C430S311000, C430S312000

Reexamination Certificate

active

08071278

ABSTRACT:
Double patterning using a single reticle. A blading technique may be used to allow a single reticle to be used for double patterning. The reticle is placed into a lithographic apparatus and a first portion of the pattern is exposed onto a first photoresist overlaying a target region, while blading the second portion of the pattern. Then, a second portion of the pattern is exposed onto a second photoresist, while blading the first portion. Alternatively, each portion of the pattern may be exposed to the photoresist simultaneously, but to different target regions. Then shot coordinates are adjusted and the portions are exposed to a photoresist again to allow creation of the composite pattern in at least one of the target regions. During the double patterning process, the reticle may be kept in the lithographic apparatus.

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Hand, Aaron, “Double Patterning Wrings More From Immersion Lithography”, Reed Business Information, retrieved from website: <http://www.semiconductor.net/article/CA6409507.html>, dated Feb. 1, 2007,5 pages.

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