Multiple mask step and scan aligner

Details Multiple mask step and scan aligner Multiple mask step and scan aligner

2005-08-23

2005-08-23

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

Reexamination Certificate

active

06934008

ABSTRACT:
A new optical lithographic exposure apparatus is described. The apparatus may comprise, for example, a lithographic stepper or scanner. A wafer stage comprises a means of supporting a semiconductor wafer. A mask stage comprises a means of holding a first mask and a second mask and maintaining a fixed relative position between the first mask and the second mask. The mask stage may further comprise an independent means of aligning each mask. A light source comprises a means to selectively shine actinic light through one of the first mask and the second mask. An imaging lens is capable of focusing the actinic light onto the semiconductor wafer.

REFERENCES:
patent: 4924258 (1990-05-01), Tsutsui
patent: 5847813 (1998-12-01), Hirayanagi
patent: 5989761 (1999-11-01), Kawakubo et al.
patent: 2004/0032575 (2004-02-01), Nishi et al.
patent: 2004/0043311 (2004-03-01), McCullough et al.
patent: 2004/0156028 (2004-08-01), Okada
U.S. Appl. No. 10/056,650, filed Jan. 28, 2002; Lin.

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