Multiple level photolithography

Details Multiple level photolithography Multiple level photolithography

2008-03-25

2008-03-25

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S046000, C355S074000

Reexamination Certificate

active

11200421

ABSTRACT:
A method is provided for performing photolithography on a substrate which has a first region on a lower level and a second region on an upper level, wherein a first pattern area exists within said first region, a second pattern area exists within said second region, and at least said first and second regions are coated with a photoresist, the method comprising: a) exposing the photoresist through a first mask so as to expose said first region including said first pattern area, and thus create a first pattern in said first pattern area, but not expose said second pattern area; and b) exposing the photoresist through a second mask so as to expose said second pattern area, and thus create a second pattern in said second pattern area, but not expose said first pattern area, and also to expose an area of said first region which lies adjacent said second region.

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