Multiple level photolithography

Details Multiple level photolithography Multiple level photolithography

2005-09-27

2005-09-27

Duda, Kathleen (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Plural exposure steps

C430S396000, C430S311000

Reexamination Certificate

active

06949330

ABSTRACT:
A method is provided for performing photolithography on a substrate which has a first region on a lower level and a second region on an upper level, wherein a first pattern area exists within said first region, a second pattern area exists within said second region, and at least said first and second regions are coated with a photoresist, the method comprising:a) exposing the photoresist through a first mask so as to expose said first region including said first pattern area, and thus create a first pattern in said first pattern area, but not expose said second pattern area; andb) exposing the photoresist through a second mask so as to expose said second pattern area, and thus create a second pattern in said second pattern area, but not expose said first pattern area, and also to expose an area of said first region which lies adjacent said second region.

REFERENCES:
patent: 4210465 (1980-07-01), Brower
patent: 4690728 (1987-09-01), Tsang et al.
patent: 4829024 (1989-05-01), Klein et al.
patent: 5134058 (1992-07-01), Han
patent: 5310457 (1994-05-01), Ziger
patent: 5612956 (1997-03-01), Walker et al.
patent: 5702868 (1997-12-01), Kellam et al.
patent: 5790552 (1998-08-01), Proctor et al.
patent: 6171405 (2001-01-01), Lee
patent: 6251564 (2001-06-01), Lin et al.
patent: 2003/0022112 (2003-01-01), Arifin et al.
patent: 0468818 (1991-07-01), None
patent: 0618709 (1994-02-01), None
patent: 0 601 887 (1994-06-01), None
patent: 0705000 (1995-09-01), None
patent: 0618709 (1998-03-01), None
patent: 0705000 (1998-05-01), None
patent: 1122916 (2001-01-01), None
patent: 2270820 (1994-03-01), None
patent: 0121217.4 (2001-09-01), None
patent: 0122221.5 (2001-09-01), None
patent: 0125612.2 (2001-10-01), None
patent: 0126246.8 (2001-11-01), None
patent: 02-280439 (1990-11-01), None
patent: 09 055746 (1997-02-01), None
patent: WO 90/07832 (1990-07-01), None
EP Search Report, EP Application No. EP02102074, dated Jul. 24, 2003.
S.M. Sze, VLSI Technology, McGraw-Hill Book Company, New York (1983), pp. 267-268, 303-304.

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